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Efficient hybrid metrology for focus, CD, and overlay

dc.contributor.authorTel, Wim
dc.contributor.authorSegers, B.
dc.contributor.authorAnunciado, Roy
dc.contributor.authorZhang, Y.
dc.contributor.authorWong, Patrick
dc.contributor.authorHasan, T.
dc.contributor.authorPrentice, C.
dc.date.accessioned2021-10-24T14:49:12Z
dc.date.available2021-10-24T14:49:12Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29558
dc.sourceIIOimport
dc.titleEfficient hybrid metrology for focus, CD, and overlay
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage101452E
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USa
dc.identifier.urlhttps://doi.org/10.1117/12.2257965
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10145


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