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Off-line mask-to-mask registration characterization

dc.contributor.authorvan Haren, Richard
dc.contributor.authorSteinert, Steffen
dc.contributor.authorRoelofs, Christian
dc.contributor.authorMouraille, Orion
dc.contributor.authorD'have, Koen
dc.contributor.authorvan Dijk, Leon
dc.contributor.authorBeyer, Dirk
dc.date.accessioned2021-10-24T16:12:25Z
dc.date.available2021-10-24T16:12:25Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29690
dc.sourceIIOimport
dc.titleOff-line mask-to-mask registration characterization
dc.typeMeeting abstract
dc.contributor.imecauthorvan Haren, Richard
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1045111-1
dc.source.endpage1045111-16
dc.source.conferencePhotomask Photomask Technology and EUV Lithography
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2280635
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10451


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