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Advanced 193 nm step and scan technology

dc.contributor.authorStoeldraijer, J.
dc.contributor.authorMulkens, J.
dc.contributor.authorDavies, G.
dc.contributor.authorSytsma, J.
dc.contributor.authorBakker, H.
dc.contributor.authorGlatzel, H.
dc.contributor.authorWagner, C.
dc.contributor.authorRoempp, O.
dc.contributor.authorBoerret, R.
dc.contributor.authorGoethals, Mieke
dc.date.accessioned2021-10-01T09:02:04Z
dc.date.available2021-10-01T09:02:04Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2977
dc.sourceIIOimport
dc.titleAdvanced 193 nm step and scan technology
dc.typeMeeting abstract
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference4th International Symposium on 193 nm Lithography. Abstracts Book. "193nm '98. At the Peak"
dc.source.conferencedate14/09/1998
dc.source.conferencelocationTelfs Austria
imec.availabilityPublished - open access


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