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Inluence of post exposure bake time on EUV photoresist RLS trade-off

dc.contributor.authorVesters, Yannick
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-24T18:10:11Z
dc.date.available2021-10-24T18:10:11Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29867
dc.sourceIIOimport
dc.titleInluence of post exposure bake time on EUV photoresist RLS trade-off
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.identifier.doi10.1117/12.2257910
dc.source.peerreviewyes
dc.source.beginpage1014324
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate22/03/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10143


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