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Establishing the relationship between low-k dielectric properties and intrinsic conduction and degradation mechanisms

dc.contributor.authorWu, Chen
dc.contributor.authorLi, Yunlong
dc.contributor.authorCroes, Kristof
dc.date.accessioned2021-10-24T19:07:59Z
dc.date.available2021-10-24T19:07:59Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29949
dc.sourceIIOimport
dc.titleEstablishing the relationship between low-k dielectric properties and intrinsic conduction and degradation mechanisms
dc.typeMeeting abstract
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewno
dc.source.beginpageED.9.7.01
dc.source.conferenceMRS Spring-Symposium ED9-Advanced Interconnects for Logic and Memory Applications - Materials, Processes and Integration
dc.source.conferencedate17/04/2017
dc.source.conferencelocationPhoenix, AZ USA
dc.identifier.urlhttps://mrsspring.zerista.com/event/member/365550?embedded=1
imec.availabilityPublished - imec


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