dc.contributor.author | Zhang, Quan-Zi | |
dc.contributor.author | Tinck, Stefan | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Zhang, Liping | |
dc.contributor.author | Bogaerts, Annemie | |
dc.date.accessioned | 2021-10-24T20:00:56Z | |
dc.date.available | 2021-10-24T20:00:56Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 0003-6951 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/30022 | |
dc.source | IIOimport | |
dc.title | Mechanisms for plasma cryogenic etching of porous materials | |
dc.type | Journal article | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | Zhang, Liping | |
dc.source.peerreview | yes | |
dc.source.beginpage | 173104 | |
dc.source.journal | Applied Physics Letters | |
dc.source.issue | 17 | |
dc.source.volume | 111 | |
dc.identifier.url | http://aip.scitation.org/doi/abs/10.1063/1.4999439 | |
imec.availability | Published - imec | |