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Mechanisms for plasma cryogenic etching of porous materials

dc.contributor.authorZhang, Quan-Zi
dc.contributor.authorTinck, Stefan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorZhang, Liping
dc.contributor.authorBogaerts, Annemie
dc.date.accessioned2021-10-24T20:00:56Z
dc.date.available2021-10-24T20:00:56Z
dc.date.issued2017
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30022
dc.sourceIIOimport
dc.titleMechanisms for plasma cryogenic etching of porous materials
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorZhang, Liping
dc.source.peerreviewyes
dc.source.beginpage173104
dc.source.journalApplied Physics Letters
dc.source.issue17
dc.source.volume111
dc.identifier.urlhttp://aip.scitation.org/doi/abs/10.1063/1.4999439
imec.availabilityPublished - imec


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