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0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling

dc.contributor.authorTritchkov, Alexander
dc.contributor.authorStirnimann, J.
dc.contributor.authorGangala, Hareen K
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-01T09:07:46Z
dc.date.available2021-10-01T09:07:46Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3003
dc.sourceIIOimport
dc.title0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
dc.typeJournal article
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3398
dc.source.endpage3404
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume12
imec.availabilityPublished - imec


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