Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Articles
View item
imec Publications Repository
imec Publications
Articles
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
View/
open
2662.pdf (161.4Kb)
Metadata
Show full item record
Authors
Tritchkov, Alexander
;
Stirnimann, J.
;
Gangala, Hareen K
;
Ronse, Kurt
Issue
6
Journal
Journal of Vacuum Science and Technology B
Volume
12
Title
0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
Publication type
Journal article
Embargo date
9999-12-31
Collections
Articles
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login