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0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
Publication:
0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling
Date
1998
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tritchkov, Alexander
;
Stirnimann, J.
;
Gangala, Hareen K
;
Ronse, Kurt
Journal
Journal of Vacuum Science and Technology B
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since deposited on 2021-10-01
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since deposited on 2021-10-01
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5
since deposited on 2021-10-01
Acq. date: 2025-10-23
Views
2300
since deposited on 2021-10-01
Acq. date: 2025-10-23
Citations