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Tunable bandwidth for application-specific SAxP process enhancement

dc.contributor.authorAlagna, Paolo
dc.contributor.authorConley, Will
dc.contributor.authorRechsteiner, Greg
dc.contributor.authorNafus, Kathleen
dc.contributor.authorBiesemans, Serge
dc.contributor.authorLorusso, Gian
dc.date.accessioned2021-10-25T16:31:41Z
dc.date.available2021-10-25T16:31:41Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30096
dc.sourceIIOimport
dc.titleTunable bandwidth for application-specific SAxP process enhancement
dc.typeProceedings paper
dc.contributor.imecauthorAlagna, Paolo
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorLorusso, Gian
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1058705
dc.source.conferenceOptical Microlithography XXXI
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2300511
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10587


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