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Selectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process

dc.contributor.authorArmini, Silvia
dc.contributor.authorHerregods, Sebastiaan
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorLee, Wei Ti
dc.contributor.authorLarson, Tom
dc.contributor.authorFigueiro, Nivea
dc.contributor.authorKoret, Roy
dc.contributor.authorWolfling, Shay
dc.date.accessioned2021-10-25T16:34:25Z
dc.date.available2021-10-25T16:34:25Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30144
dc.sourceIIOimport
dc.titleSelectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process
dc.typeOral presentation
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorHerregods, Sebastiaan
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewno
dc.source.conferenceSPIE Aadvanced Litography
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotes10585-38


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