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Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions

dc.contributor.authorArmini, Silvia
dc.contributor.authorZyulkov, Ivan
dc.contributor.authorHerregods, Sebastiaan
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-25T16:34:37Z
dc.date.available2021-10-25T16:34:37Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30147
dc.sourceIIOimport
dc.titleArea-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
dc.typeMeeting abstract
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorZyulkov, Ivan
dc.contributor.imecauthorHerregods, Sebastiaan
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.conference40th International Symposium on Dry Process - DPS 2018
dc.source.conferencedate11/11/2018
dc.source.conferencelocationNagoya Japan
dc.identifier.urlhttp://www.dry-process.org/2018/plenary.html
imec.availabilityPublished - imec


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