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dc.contributor.authorBaert, Rogier
dc.contributor.authorCiofi, Ivan
dc.contributor.authorRoussel, Philippe
dc.contributor.authorMattii, Luca
dc.contributor.authorDebacker, Peter
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-25T16:37:14Z
dc.date.available2021-10-25T16:37:14Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30180
dc.sourceIIOimport
dc.titleSystem-level impact of interconnect line-edge roughness
dc.typeProceedings paper
dc.contributor.imecauthorBaert, Rogier
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorDebacker, Peter
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecDebacker, Peter::0000-0003-3825-5554
dc.source.peerreviewyes
dc.source.beginpage67
dc.source.endpage69
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate4/06/2018
dc.source.conferencelocationSanta Clara, CA USA
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8430429/
imec.availabilityPublished - imec


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