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FIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV

dc.contributor.authorPrewett, P. D.
dc.contributor.authorMartin, B.
dc.contributor.authorWatson, J. G.
dc.contributor.authorEastwood, A. W.
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-09-29T12:45:35Z
dc.date.available2021-09-29T12:45:35Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/301
dc.sourceIIOimport
dc.titleFIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV
dc.typeJournal article
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage127
dc.source.endpage130
dc.source.journalMicroelectronic Engineering
dc.source.volume23
imec.availabilityPublished - imec
imec.internalnotesConference on Microelectronic Engineering; Sept. 1993; Maastricht


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