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FIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV
Publication:
FIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV
Date
1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Prewett, P. D.
;
Martin, B.
;
Watson, J. G.
;
Eastwood, A. W.
;
Jonckheere, Rik
Journal
Microelectronic Engineering
Abstract
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2069
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-04
Citations
Metrics
Views
2069
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-04
Citations