Publication:
FIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV
Date
| dc.contributor.author | Prewett, P. D. | |
| dc.contributor.author | Martin, B. | |
| dc.contributor.author | Watson, J. G. | |
| dc.contributor.author | Eastwood, A. W. | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-09-29T12:45:35Z | |
| dc.date.available | 2021-09-29T12:45:35Z | |
| dc.date.issued | 1994 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/301 | |
| dc.source.beginpage | 127 | |
| dc.source.endpage | 130 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 23 | |
| dc.title | FIB repair of reticle defects with antistaining-effects on optical lithography from G-line to DUV | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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