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EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction

dc.contributor.authorBekaert, Joost
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorBeral, Christophe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorvan de Kerkhof, Mark A..
dc.contributor.authorBouten, Sander
dc.contributor.authorKupers, Michiel
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorVerduijn, Erik
dc.contributor.authorBrunner, Timothy
dc.date.accessioned2021-10-25T16:41:51Z
dc.date.available2021-10-25T16:41:51Z
dc.date.issued2018
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30226
dc.sourceIIOimport
dc.titleEUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
dc.typeJournal article
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage41013
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume17
dc.identifier.urlhttps://doi.org/10.1117/1.JMM.17.4.041013
imec.availabilityPublished - open access


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