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EUV vote-taking lithography: Crazy.... or not ?

dc.contributor.authorBekaert, Joost
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorBeral, Christophe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorvan de Kerkhof, Mark A.
dc.contributor.authorBouten, Sander
dc.contributor.authorKupers, Michiel
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorVerduijn, Erik
dc.contributor.authorBrunner, Timothy
dc.date.accessioned2021-10-25T16:41:58Z
dc.date.available2021-10-25T16:41:58Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30227
dc.sourceIIOimport
dc.titleEUV vote-taking lithography: Crazy.... or not ?
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage105830I
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate26/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2299509
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10583


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