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Low damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3

dc.contributor.authorChanson, Romain
dc.contributor.authorTahara, Shigeru
dc.contributor.authorVanstreels, Kris
dc.contributor.authorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-25T17:08:52Z
dc.date.available2021-10-25T17:08:52Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30389
dc.sourceIIOimport
dc.titleLow damage ultra-low-k patterning using a high boiling point organic (HBPO) combined with NF3
dc.typeJournal article
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.source.peerreviewyes
dc.source.beginpage15006
dc.source.journalPlasma Research Express (IOP)
dc.source.volume1
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/2516-1067/aad92e/meta
imec.availabilityPublished - imec


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