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ESD challenges in advanced FinFET and GAA nanowire CMOS technologies

dc.contributor.authorChen, Shih-Hung
dc.date.accessioned2021-10-25T17:11:40Z
dc.date.available2021-10-25T17:11:40Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30402
dc.sourceIIOimport
dc.titleESD challenges in advanced FinFET and GAA nanowire CMOS technologies
dc.typeOral presentation
dc.contributor.imecauthorChen, Shih-Hung
dc.source.peerreviewno
dc.source.conference2018 EOS/ESD Symposium
dc.source.conferencedate23/09/2018
dc.source.conferencelocationReno, NV USA
dc.identifier.urlhttps://www.esda.org/assets/Updates/New%20directory/2018%20Symposium%20Program%20v25.pdf
imec.availabilityPublished - imec
imec.internalnotesDD317. Tutorial


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