Show simple item record

Stochastic effects in EUV lithography

dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-25T17:35:54Z
dc.date.available2021-10-25T17:35:54Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30500
dc.sourceIIOimport
dc.titleStochastic effects in EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHendrickx, Eric
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage105831K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2300541
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10583


Files in this item

Thumbnail
Name:
37768.pdf
Size:
1.017Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record