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Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer
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Authors
de Marneffe, Jean-Francois
;
Chan, BT
;
Spieser, Martin
;
Vereecke, Guy
;
Naumov, Sergej
;
Vanhaeren, Danielle
;
Knoll, Armin
;
Wolf, Heiko
ISSN
1936-0851
Issue
11
Journal
ACS Nano
Volume
12
Title
Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer
Publication type
Journal article
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