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Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer
Publication:
Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer
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Date
2018
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
de Marneffe, Jean-Francois
;
Chan, BT
;
Spieser, Martin
;
Vereecke, Guy
;
Naumov, Sergej
;
Vanhaeren, Danielle
;
Knoll, Armin
;
Wolf, Heiko
Journal
ACS Nano
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1895
since deposited on 2021-10-25
Acq. date: 2025-12-10
Citations
Metrics
Views
1895
since deposited on 2021-10-25
Acq. date: 2025-12-10
Citations