Show simple item record

Conversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorChan, BT
dc.contributor.authorSpieser, Martin
dc.contributor.authorVereecke, Guy
dc.contributor.authorNaumov, Sergej
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorKnoll, Armin
dc.contributor.authorWolf, Heiko
dc.date.accessioned2021-10-25T17:44:24Z
dc.date.available2021-10-25T17:44:24Z
dc.date.issued2018
dc.identifier.issn1936-0851
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30533
dc.sourceIIOimport
dc.titleConversion of a patterned organic resist into a high performance inoriganic hard mask for high resolution pattern transfer
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.source.peerreviewyes
dc.source.beginpage11152
dc.source.endpage11160
dc.source.journalACS Nano
dc.source.issue11
dc.source.volume12
dc.identifier.urlhttps://pubs.acs.org/doi/10.1021/acsnano.8b05596
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record