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The path to better understanding stochastics in EUV photoresist

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVesters, Yannick
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-25T17:50:01Z
dc.date.available2021-10-25T17:50:01Z
dc.date.issued2018
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30554
dc.sourceIIOimport
dc.titleThe path to better understanding stochastics in EUV photoresist
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.source.peerreviewyes
dc.source.beginpage651
dc.source.endpage655
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue5
dc.source.volume31
dc.identifier.urlhttps://doi.org/10.2494/photopolymer.31.651
imec.availabilityPublished - imec


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