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Characterization of TaCl5-based ALD TaN films in metal gate stacks

dc.contributor.authorDekkers, Harold
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorSchram, Tom
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-25T17:58:48Z
dc.date.available2021-10-25T17:58:48Z
dc.date.issued2018
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30584
dc.sourceIIOimport
dc.titleCharacterization of TaCl5-based ALD TaN films in metal gate stacks
dc.typeJournal article
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.beginpage165307
dc.source.journalJournal of Applied Physics
dc.source.issue16
dc.source.volume124
dc.identifier.urlhttps://doi.org/10.1063/1.5040840
imec.availabilityPublished - imec


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