Show simple item record

On the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications

dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorKujala, Jiri
dc.contributor.authorSlotte, Jonatan
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSimoen, Eddy
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorShimura, Yosuke
dc.contributor.authorLoo, Roger
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-25T18:10:13Z
dc.date.available2021-10-25T18:10:13Z
dc.date.issued2018-04
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30620
dc.sourceIIOimport
dc.titleOn the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications
dc.typeJournal article
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.beginpageP228
dc.source.endpageP237
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue5
dc.source.volume7
dc.identifier.urlhttp://jss.ecsdl.org/content/7/5/P228.abstract
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record