Show simple item record

Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?

dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorMesilhy, Hazem
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBauer, Markus
dc.date.accessioned2021-10-25T18:30:08Z
dc.date.available2021-10-25T18:30:08Z
dc.date.issued2018
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30681
dc.sourceIIOimport
dc.titleAttenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage11005
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue1
dc.source.volume18
dc.identifier.urlhttps://doi.org/10.1117/1.JMM.18.1.011005
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
40688.pdf
Size:
8.943Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record