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Attenuated PSM for EUV: Can they mitigate 3D mask effects?

dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorMesilhy, Hazem
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorBauer, Markus
dc.date.accessioned2021-10-25T18:30:28Z
dc.date.available2021-10-25T18:30:28Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30682
dc.sourceIIOimport
dc.titleAttenuated PSM for EUV: Can they mitigate 3D mask effects?
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1058312
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate26/02/2018
dc.source.conferencelocationSan José USA
dc.identifier.urlhttps://doi.org/10.1117/12.2299648
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10583


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