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Analysis of diffusion mechanisms for SSD in confined volumes : An alternative solution for extension formation in N7 and N5 technologies

dc.contributor.authorEyben, Pierre
dc.contributor.authorPawlak, Bartek
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorKikuchi, Yoshiaki
dc.contributor.authorMitard, Jerome
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMocuta, Dan
dc.contributor.authorMocuta, Anda
dc.date.accessioned2021-10-25T18:33:06Z
dc.date.available2021-10-25T18:33:06Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30690
dc.sourceIIOimport
dc.titleAnalysis of diffusion mechanisms for SSD in confined volumes : An alternative solution for extension formation in N7 and N5 technologies
dc.typeMeeting abstract
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorKikuchi, Yoshiaki
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewno
dc.source.beginpageI.15.5
dc.source.conferenceE-MRS Spring Symposium I: Materials Research for Group IV Semiconductors: Growth, Characterization and Technological Development
dc.source.conferencedate18/06/2018
dc.source.conferencelocationStrasbourg France
imec.availabilityPublished - imec


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