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Combining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wires

dc.contributor.authorFavia, Paola
dc.contributor.authorCelano, Umberto
dc.contributor.authorDrijbooms, Chris
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorCapogreco, Elena
dc.contributor.authorVancoille, Eric
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-25T18:35:26Z
dc.date.available2021-10-25T18:35:26Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30697
dc.sourceIIOimport
dc.titleCombining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wires
dc.typeProceedings paper
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorCelano, Umberto
dc.contributor.imecauthorDrijbooms, Chris
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.source.peerreviewno
dc.source.conference19th International Microscopy Congress - IMC19
dc.source.conferencedate9/09/2018
dc.source.conferencelocationSydney Australia
imec.availabilityPublished - imec


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