Show simple item record

Nanobeam diffraction strain analysis of released Ge gate-all-around nano-wires: challenges and limitations

dc.contributor.authorFavia, Paola
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorCapogreco, Elena
dc.contributor.authorVancoille, Eric
dc.contributor.authorBender, Hugo
dc.date.accessioned2021-10-25T18:35:46Z
dc.date.available2021-10-25T18:35:46Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30698
dc.sourceIIOimport
dc.titleNanobeam diffraction strain analysis of released Ge gate-all-around nano-wires: challenges and limitations
dc.typeMeeting abstract
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.source.peerreviewno
dc.source.conference19th International Microscopy Congress - IMC19
dc.source.conferencedate9/09/2018
dc.source.conferencelocationSydney Australia
dc.identifier.urlhttp://abstracts.imc19.com/pdf/abstract_203.pdf
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record