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Challenges of large area integration of 2D materials in CMOS line

dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorSchram, Tom
dc.contributor.authorSmets, Quentin
dc.contributor.authorChiappe, Daniele
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorBrems, Steven
dc.contributor.authorVerguts, Ken
dc.contributor.authorMarinov, Daniil
dc.contributor.authorPantouvaki, Marianna
dc.date.accessioned2021-10-25T20:05:53Z
dc.date.available2021-10-25T20:05:53Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30928
dc.sourceIIOimport
dc.titleChallenges of large area integration of 2D materials in CMOS line
dc.typeMeeting abstract
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorSmets, Quentin
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecSmets, Quentin::0000-0002-2356-5915
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceGraphene Conference 2018
dc.source.conferencedate26/06/2018
dc.source.conferencelocationDresden Germany
dc.identifier.urlhttp://phantomsfoundation.com/GRAPHENECONF/2018/Abstracts/Grapheneconf_2018_Huyghebaert.pdf
imec.availabilityPublished - open access


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