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Localizing manufacturing defects in 3-D IC technology by scanning photocapacitance microscopy

dc.contributor.authorJacobs, Kristof J.P.
dc.date.accessioned2021-10-25T20:12:41Z
dc.date.available2021-10-25T20:12:41Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30944
dc.sourceIIOimport
dc.titleLocalizing manufacturing defects in 3-D IC technology by scanning photocapacitance microscopy
dc.typeOral presentation
dc.contributor.imecauthorJacobs, Kristof J.P.
dc.contributor.orcidimecJacobs, Kristof J.P.::0000-0002-1081-3633
dc.source.peerreviewno
dc.source.conferenceInvited seminar at Ultrafast Photonics Laboratory
dc.source.conferencedate19/10/2018
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - imec


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