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Investigation of OLED characteristics evolution under sequential photolithography patterning processes

dc.contributor.authorKe, Tung Huei
dc.contributor.authorMalinowski, Pawel
dc.contributor.authorNakamura, Atsushi
dc.contributor.authorVander Velpen, Dieter
dc.contributor.authorVandenplas, Erwin
dc.contributor.authorHeremans, Paul
dc.date.accessioned2021-10-25T20:50:56Z
dc.date.available2021-10-25T20:50:56Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31031
dc.sourceIIOimport
dc.titleInvestigation of OLED characteristics evolution under sequential photolithography patterning processes
dc.typeOral presentation
dc.contributor.imecauthorKe, Tung Huei
dc.contributor.imecauthorMalinowski, Pawel
dc.contributor.imecauthorVandenplas, Erwin
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecKe, Tung Huei::0000-0001-8381-4998
dc.contributor.orcidimecMalinowski, Pawel::0000-0002-2934-470X
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewno
dc.source.conference18th International Meeting on Information Display - IMID
dc.source.conferencedate28/08/2018
dc.source.conferencelocationBusan Korea
imec.availabilityPublished - imec


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