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Effect of cleaning chemistries on cobalt: surface chemistries

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorAkanishi, Yuya
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorMizutani, Atsushi
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-25T21:40:24Z
dc.date.available2021-10-25T21:40:24Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31136
dc.sourceIIOimport
dc.titleEffect of cleaning chemistries on cobalt: surface chemistries
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorAkanishi, Yuya
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.source.peerreviewyes
dc.source.beginpage263
dc.source.endpage267
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIV - UCPSS
dc.source.conferencedate2/09/2018
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttps://www.scientific.net/SSP.282.263
imec.availabilityPublished - imec
imec.internalnotesSolid State Ohenomena; Vol. 282


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