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dc.contributor.authorVereecke, Guy
dc.contributor.authorRöhr, Erika
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-01T09:36:18Z
dc.date.available2021-10-01T09:36:18Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3114
dc.sourceIIOimport
dc.titleEvaluation of a dry laser cleaning process for the removal of surface particles
dc.typeOral presentation
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHeyns, Marc
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3959


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