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Epitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures

dc.contributor.authorLoo, Roger
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorCott, Daire
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSchulze, Andreas
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVanherle, Wendy
dc.contributor.authorEneman, Geert
dc.contributor.authorRichard, Olivier
dc.contributor.authorFavia, Paola
dc.contributor.authorMitard, Jerome
dc.contributor.authorMocuta, Dan
dc.contributor.authorLanger, Robert
dc.contributor.authorCollaert, Nadine
dc.date.accessioned2021-10-25T22:27:03Z
dc.date.available2021-10-25T22:27:03Z
dc.date.issued2018-02
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31228
dc.sourceIIOimport
dc.titleEpitaxial CVD growth of ultra-thin Si passivation layers on strained Ge fin structures
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorCott, Daire
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVanherle, Wendy
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.identifier.doi10.1149/2.0191802jss
dc.source.peerreviewyes
dc.source.beginpageP66
dc.source.endpageP72
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue2
dc.source.volume7
dc.identifier.urlhttp://jss.ecsdl.org/cgi/content/abstract/7/2/P66.
imec.availabilityPublished - imec


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