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Epitaxial GeSn: Impact of process conditions on material quality

dc.contributor.authorLoo, Roger
dc.contributor.authorShimura, Yosuke
dc.contributor.authorIke, Shinichi
dc.contributor.authorVohra, Anurag
dc.contributor.authorStoica, Toma
dc.contributor.authorStange, Daniela
dc.contributor.authorBuca, Dan
dc.contributor.authorKohen, David
dc.contributor.authorMargetis, Joe
dc.contributor.authorTolle, John
dc.date.accessioned2021-10-25T22:30:21Z
dc.date.available2021-10-25T22:30:21Z
dc.date.issued2018
dc.identifier.issn0268-1242
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31234
dc.sourceIIOimport
dc.titleEpitaxial GeSn: Impact of process conditions on material quality
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVohra, Anurag
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVohra, Anurag::0000-0002-2831-0719
dc.source.peerreviewyes
dc.source.beginpage114010
dc.source.journalSemiconductor Science and Technology
dc.source.issue11
dc.source.volume33
dc.identifier.urlhttps://doi.org/10.1088/1361-6641/aae2f9
imec.availabilityPublished - imec


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