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Need for LWR metrology standardization: the imec roughness protocol

dc.contributor.authorLorusso, Gian
dc.contributor.authorSutani, Takeyoshi
dc.contributor.authorRutigliani, Vito
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorMoussa, Alan
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorMack, Chris
dc.contributor.authorNaulleau, Patrick
dc.contributor.authorPerera, Chami
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorIkota, Masami
dc.contributor.authorIshimoto, Toru
dc.contributor.authorKoshihara, Shunshuke
dc.date.accessioned2021-10-25T22:34:38Z
dc.date.available2021-10-25T22:34:38Z
dc.date.issued2018
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31242
dc.sourceIIOimport
dc.titleNeed for LWR metrology standardization: the imec roughness protocol
dc.typeJournal article
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorCharley, Anne-Laure
dc.source.peerreviewyes
dc.source.beginpage41009
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume17
dc.identifier.urlhttps://doi.org/10.1117/1.JMM.17.4.041009
imec.availabilityPublished - imec


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