dc.contributor.author | Luong, Vu | |
dc.contributor.author | Philipsen, Vicky | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Opsomer, Karl | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Laubis, Christian | |
dc.contributor.author | Scholze, Frank | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-25T22:38:18Z | |
dc.date.available | 2021-10-25T22:38:18Z | |
dc.date.issued | 2018 | |
dc.identifier.issn | 2076-3417 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/31249 | |
dc.source | IIOimport | |
dc.title | Ni-Al alloys as alternative EUV mask absorber | |
dc.type | Journal article | |
dc.contributor.imecauthor | Luong, Vu | |
dc.contributor.imecauthor | Philipsen, Vicky | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Opsomer, Karl | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
dc.source.peerreview | yes | |
dc.source.beginpage | 521 | |
dc.source.journal | Applied Sciences | |
dc.source.issue | 4 | |
dc.source.volume | 8 | |
dc.identifier.url | http://www.mdpi.com/2076-3417/8/4/521 | |
imec.availability | Published - imec | |