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Advancing X-ray metrology for routine thin film analysis

dc.contributor.authorMakhotkin, Igor
dc.contributor.authorFathabad, Zahra
dc.contributor.authorYakunin, Sergey
dc.contributor.authorvan de Kruijs, Robbert
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorBijkerk, Fred
dc.date.accessioned2021-10-25T22:45:31Z
dc.date.available2021-10-25T22:45:31Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31263
dc.sourceIIOimport
dc.titleAdvancing X-ray metrology for routine thin film analysis
dc.typeProceedings paper
dc.contributor.imecauthorMakhotkin, Igor
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conference13th International MicroNanoConference - iMNC
dc.source.conferencedate11/12/2018
dc.source.conferencelocationAmsterdam Netherlands
imec.availabilityPublished - imec


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