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Wet-chemical etching of atom probe tips for artefact free analyses of nanoscaled semiconductor structures

dc.contributor.authorMelkonyan, Davit
dc.contributor.authorFleischmann, Claudia
dc.contributor.authorVeloso, Anabela
dc.contributor.authorFranquet, Alexis
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorMorris, Richard
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-25T23:21:39Z
dc.date.available2021-10-25T23:21:39Z
dc.date.issued2018
dc.identifier.issn0304-3991
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31331
dc.sourceIIOimport
dc.titleWet-chemical etching of atom probe tips for artefact free analyses of nanoscaled semiconductor structures
dc.typeJournal article
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorMorris, Richard
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecMorris, Richard::0000-0002-0902-7088
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage8
dc.source.journalUltramicroscopy
dc.source.volume186
dc.identifier.urlhttps://www.sciencedirect.com/science/article/pii/S0304399117303728
imec.availabilityPublished - imec


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