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An in-depth study of high-performing strained germanium nanaowires pFETs

dc.contributor.authorMitard, Jerome
dc.contributor.authorJang, Doyoung
dc.contributor.authorEneman, Geert
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorParvais, Bertrand
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Marcke, Patricia
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorCapogreco, Elena
dc.contributor.authorBender, Hugo
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorMertens, Hans
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLoo, Roger
dc.contributor.authorDekkers, Harold
dc.contributor.authorSebaai, Farid
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorMocuta, Anda
dc.contributor.authorCollaert, Nadine
dc.date.accessioned2021-10-25T23:33:13Z
dc.date.available2021-10-25T23:33:13Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31352
dc.sourceIIOimport
dc.titleAn in-depth study of high-performing strained germanium nanaowires pFETs
dc.typeProceedings paper
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorJang, Doyoung
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorParvais, Bertrand
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Marcke, Patricia
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorCapogreco, Elena
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecParvais, Bertrand::0000-0003-0769-7069
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83
dc.source.endpage84
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate18/06/2018
dc.source.conferencelocationHonolulu, HI USA
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8510666
imec.availabilityPublished - open access


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