Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth

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Authors

Murota, Junichi; Yamamoto, Yuchi; Costina, Ioan; Tillack, Bernd; Le Thanh, Vin; Loo, Roger; Caymax, Matty

DOI

10.1149/2.0071806jss

ISSN

2162-8769

Issue

6

Journal

ECS Journal of Solid State Science and Technology

Volume

7

Title

Atomically controlled processing for dopant segregation in CVD Si and Ge epitaxial growth

Publication type

Journal article

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