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dc.contributor.authorOesterberg, Frederik Westergaard
dc.contributor.authorWitthoeft, Maria-Louise
dc.contributor.authorDutta, Shibesh
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorNielsen, Peter Former
dc.contributor.authorHansen, Ole
dc.contributor.authorPetersen, Dirch Hjorth
dc.date.accessioned2021-10-26T00:20:30Z
dc.date.available2021-10-26T00:20:30Z
dc.date.issued2018
dc.identifier.issn2158-3226
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31439
dc.sourceIIOimport
dc.titleHall effect measurement for precise sheet resistance and thickness evaluation of Ruthenium thin films using non-equidistant four-point probes
dc.typeJournal article
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage055206-1
dc.source.endpage055206-7
dc.source.journalAIP Advances
dc.source.issue5
dc.source.volume8
dc.identifier.urlhttps://doi.org/10.1063/1.5010399
imec.availabilityPublished - imec


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