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Contact inspection of Si nanowire with SEM voltage contrast

dc.contributor.authorOhashi, Takeyoshi
dc.contributor.authorYamaguchi, Atsuko
dc.contributor.authorHasumi, Kazuhisa
dc.contributor.authorIkota, Masami
dc.contributor.authorLorusso, Gian
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-26T00:22:46Z
dc.date.available2021-10-26T00:22:46Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31443
dc.sourceIIOimport
dc.titleContact inspection of Si nanowire with SEM voltage contrast
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage105850B
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2296992
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10585


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