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dc.contributor.authorPacco, Antoine
dc.contributor.authorAabdin, Zainul
dc.contributor.authorAnand, Utkarsh
dc.contributor.authorRip, Jens
dc.contributor.authorMirsaidov, Utkur
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-26T00:36:43Z
dc.date.available2021-10-26T00:36:43Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31467
dc.sourceIIOimport
dc.titleStudy of the anisotropic wet etching of nanoscale structures in alkaline solutions
dc.typeProceedings paper
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorHolsteyns, Frank
dc.source.peerreviewyes
dc.source.beginpage88
dc.source.endpage93
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIV - UCPSS
dc.source.conferencedate2/09/2018
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttps://www.scientific.net/SSP.282.88
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 282


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