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Direct metal etch for advanced interconnect

dc.contributor.authorPaolillo, Sara
dc.contributor.authorWan, Danny
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorRassoul, Nouredine
dc.contributor.authorPiumi, Daniele
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-26T00:42:08Z
dc.date.available2021-10-26T00:42:08Z
dc.date.issued2018
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31476
dc.sourceIIOimport
dc.titleDirect metal etch for advanced interconnect
dc.typeJournal article
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorWan, Danny
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorRassoul, Nouredine
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecWan, Danny::0000-0003-4847-3184
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecRassoul, Nouredine::0000-0001-9489-3396
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3.00E+103
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue3
dc.source.volume36
dc.identifier.urlhttps://doi.org/10.1116/1.5022283
imec.availabilityPublished - open access


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