dc.contributor.author | Paolillo, Sara | |
dc.contributor.author | Wan, Danny | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Rassoul, Nouredine | |
dc.contributor.author | Piumi, Daniele | |
dc.contributor.author | Tokei, Zsolt | |
dc.date.accessioned | 2021-10-26T00:42:08Z | |
dc.date.available | 2021-10-26T00:42:08Z | |
dc.date.issued | 2018 | |
dc.identifier.issn | 1071-1023 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/31476 | |
dc.source | IIOimport | |
dc.title | Direct metal etch for advanced interconnect | |
dc.type | Journal article | |
dc.contributor.imecauthor | Paolillo, Sara | |
dc.contributor.imecauthor | Wan, Danny | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Rassoul, Nouredine | |
dc.contributor.imecauthor | Piumi, Daniele | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.orcidimec | Wan, Danny::0000-0003-4847-3184 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Rassoul, Nouredine::0000-0001-9489-3396 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 3.00E+103 | |
dc.source.journal | Journal of Vacuum Science and Technology B | |
dc.source.issue | 3 | |
dc.source.volume | 36 | |
dc.identifier.url | https://doi.org/10.1116/1.5022283 | |
imec.availability | Published - open access | |