dc.contributor.author | Park, Min Hyuk | |
dc.contributor.author | Chung, Ching-Chang | |
dc.contributor.author | Schenk, Tony | |
dc.contributor.author | Richter, Claudia | |
dc.contributor.author | Opsomer, Karl | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Jones, Jacob | |
dc.contributor.author | Mikolajick, Thomas | |
dc.contributor.author | Schroeder, Uwe | |
dc.date.accessioned | 2021-10-26T00:50:22Z | |
dc.date.available | 2021-10-26T00:50:22Z | |
dc.date.issued | 2018 | |
dc.identifier.issn | 2199-160X | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/31490 | |
dc.source | IIOimport | |
dc.title | Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffraction | |
dc.type | Journal article | |
dc.contributor.imecauthor | Opsomer, Karl | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1800091-1 | |
dc.source.endpage | 1800091-10 | |
dc.source.journal | Advanced Electronic Materials | |
dc.source.issue | 7 | |
dc.source.volume | 4 | |
dc.identifier.url | https://doi.org/10.1002/aelm.201800091 | |
imec.availability | Published - imec | |