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Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffraction
Publication:
Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffraction
Date
2018
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Park, Min Hyuk
;
Chung, Ching-Chang
;
Schenk, Tony
;
Richter, Claudia
;
Opsomer, Karl
;
Detavernier, Christophe
;
Adelmann, Christoph
;
Jones, Jacob
;
Mikolajick, Thomas
;
Schroeder, Uwe
Journal
Advanced Electronic Materials
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1924
since deposited on 2021-10-26
1
last week
Acq. date: 2025-10-28
Citations
Metrics
Views
1924
since deposited on 2021-10-26
1
last week
Acq. date: 2025-10-28
Citations