Authors

Park, Min Hyuk; Chung, Ching-Chang; Schenk, Tony; Richter, Claudia; Opsomer, Karl; Detavernier, Christophe; Adelmann, Christoph; Jones, Jacob; Mikolajick, Thomas; Schroeder, Uwe

ISSN

2199-160X

Issue

7

Journal

Advanced Electronic Materials

Volume

4

Title

Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffraction

Publication type

Journal article