Publication:
Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffraction
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1930 since deposited on 2021-10-26
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Acq. date: 2026-04-26
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1930 since deposited on 2021-10-26
2last month
1last week
Acq. date: 2026-04-26
Citations